Jonas Sundqvist
@jv3sund.bsky.social
CEO AlixLabs and BALD Engineering
The conference hotel has two drinks announced for tonight as drink of the month - is this the same cocktail? @seanbarry.bsky.social
October 29, 2025 at 1:34 PM
The conference hotel has two drinks announced for tonight as drink of the month - is this the same cocktail? @seanbarry.bsky.social
Valhalla has arrived from across the pond - stay tuned for more information. Ymir is ready to open the first gate valve to fully automated 300 mm APS(TM) processing for our customers. #AlixLabs #Sweden #Semiconductor #ALEtch
October 22, 2025 at 8:58 PM
Valhalla has arrived from across the pond - stay tuned for more information. Ymir is ready to open the first gate valve to fully automated 300 mm APS(TM) processing for our customers. #AlixLabs #Sweden #Semiconductor #ALEtch
Never happened before Yesterday at the EFDS #ALDep 4 Industry committee call both me and @seanbarry.bsky.social run out of jokes and had to leave the call 5 min early. We left the Germans and the Dutch all alone in the call ha ha. How will this play down in Eindhoven @harmknoops.bsky.social !?
October 21, 2025 at 4:11 AM
Never happened before Yesterday at the EFDS #ALDep 4 Industry committee call both me and @seanbarry.bsky.social run out of jokes and had to leave the call 5 min early. We left the Germans and the Dutch all alone in the call ha ha. How will this play down in Eindhoven @harmknoops.bsky.social !?
September 21, 2025 at 7:59 PM
Glad that you sorted out that ALD works. Even for copper in this case "Reaction Mechanisms in Copper Atomic Layer Deposition Using Copper(II) Hexafluoroacetylacetonate and Diethylzinc via In Situ Time-of-Flight Mass Spectrometry" #GlyfadaNeverForget #ALDep pubs.acs.org/doi/10.1021/...
Reaction Mechanisms in Copper Atomic Layer Deposition Using Copper(II) Hexafluoroacetylacetonate and Diethylzinc via In Situ Time-of-Flight Mass Spectrometry
The development of high-quality copper (Cu) thin films by atomic layer deposition (ALD) remains challenging due to a limited understanding of the reaction mechanisms that govern film growth and compos...
pubs.acs.org
September 21, 2025 at 6:58 AM
Glad that you sorted out that ALD works. Even for copper in this case "Reaction Mechanisms in Copper Atomic Layer Deposition Using Copper(II) Hexafluoroacetylacetonate and Diethylzinc via In Situ Time-of-Flight Mass Spectrometry" #GlyfadaNeverForget #ALDep pubs.acs.org/doi/10.1021/...
September 11, 2025 at 5:55 AM
Have a nice weekend @mick--geek.bsky.social
June 27, 2025 at 5:09 PM
Have a nice weekend @mick--geek.bsky.social
Henrik used the ring @drhenke.bsky.social #aldep
June 25, 2025 at 6:11 AM
Henrik used the ring @drhenke.bsky.social #aldep
Remember that literally armies of one half cycle precursor nozxles for hydrogen peroxide metal oxide #ALDep roams freely in nature. In an coordinated attack these ants could print a high-k device if there were TMA ants.
May 23, 2025 at 4:03 AM
Remember that literally armies of one half cycle precursor nozxles for hydrogen peroxide metal oxide #ALDep roams freely in nature. In an coordinated attack these ants could print a high-k device if there were TMA ants.
May 6, 2025 at 2:03 PM
Congratulations 🎊
@mick--geek.bsky.social
@mick--geek.bsky.social
May 4, 2025 at 6:23 PM
Congratulations 🎊
@mick--geek.bsky.social
@mick--geek.bsky.social
Hobitti - I did not know @rlpuu.bsky.social
April 11, 2025 at 7:05 PM
Hobitti - I did not know @rlpuu.bsky.social
April 11, 2025 at 5:40 AM
🎤 AlixLabs on Stage at the SOLD OUT 2025 CMC Conference!
🕓 4:00 PM | March 29 | Bergström Ballroom
👨🔬 Dr. Robin Athle, Principal Engineer
"Atomic Layer Etching Pitch Splitting (APS): A New Alternative to Multi Patterning"
#ALEtch #Semiconductors #Lithography #Texas #USA #Austin
🕓 4:00 PM | March 29 | Bergström Ballroom
👨🔬 Dr. Robin Athle, Principal Engineer
"Atomic Layer Etching Pitch Splitting (APS): A New Alternative to Multi Patterning"
#ALEtch #Semiconductors #Lithography #Texas #USA #Austin
March 29, 2025 at 7:04 AM
🎤 AlixLabs on Stage at the SOLD OUT 2025 CMC Conference!
🕓 4:00 PM | March 29 | Bergström Ballroom
👨🔬 Dr. Robin Athle, Principal Engineer
"Atomic Layer Etching Pitch Splitting (APS): A New Alternative to Multi Patterning"
#ALEtch #Semiconductors #Lithography #Texas #USA #Austin
🕓 4:00 PM | March 29 | Bergström Ballroom
👨🔬 Dr. Robin Athle, Principal Engineer
"Atomic Layer Etching Pitch Splitting (APS): A New Alternative to Multi Patterning"
#ALEtch #Semiconductors #Lithography #Texas #USA #Austin
Today vi visit Odins possible birth place @alixlabs.bsky.social
March 26, 2025 at 6:33 AM
Today vi visit Odins possible birth place @alixlabs.bsky.social
@mick--geek.bsky.social Facebook algorithm after meeting you and praising your Judas t-shirt
March 25, 2025 at 6:55 PM
@mick--geek.bsky.social Facebook algorithm after meeting you and praising your Judas t-shirt
Probably the best poster at #ASD2025 in Leipzig. Talk to us if you need help with the analysis @alixlabs.bsky.social!
March 25, 2025 at 4:11 PM
Probably the best poster at #ASD2025 in Leipzig. Talk to us if you need help with the analysis @alixlabs.bsky.social!
March 23, 2025 at 12:09 PM
Nope. Bluesky has nothing to offer for #ALDep. LinkedIn has much more responsive audience and interaction - Good bye
bart simpson from the simpsons is standing in front of a green background and says goodbye now
ALT: bart simpson from the simpsons is standing in front of a green background and says goodbye now
media.tenor.com
February 10, 2025 at 8:11 PM
Nope. Bluesky has nothing to offer for #ALDep. LinkedIn has much more responsive audience and interaction - Good bye
Chipmetrics launches the PillarHall LHAR5 test chip, featuring a 100-nm gap height for precise process monitoring. It enables vendor-agnostic benchmarking, faster tool qual, & sustainable manufacturing, ensuring tighter control for 3DNAND & 3DDRAM advancements. #ALDep chipmetrics.com/the-pillarha...
February 10, 2025 at 8:05 PM
Chipmetrics launches the PillarHall LHAR5 test chip, featuring a 100-nm gap height for precise process monitoring. It enables vendor-agnostic benchmarking, faster tool qual, & sustainable manufacturing, ensuring tighter control for 3DNAND & 3DDRAM advancements. #ALDep chipmetrics.com/the-pillarha...
Reeespect! Our Norwegian exchange student left us some Lakrits! Did I tell you I love Norway 🇳🇴?
February 7, 2025 at 7:53 PM
Reeespect! Our Norwegian exchange student left us some Lakrits! Did I tell you I love Norway 🇳🇴?
AlixLabs to Showcase Latest APS™ Findings at SPIE Advanced Lithography + Patterning
Swedish semiconductor startup to demonstrate 3-nanometer class FinFET structures made with APS™ on Intel Silicon at trade show. @alixlabs.bsky.social #ALEtch #Semiconductor
www.alixlabs.com/2025/02/07/a...
Swedish semiconductor startup to demonstrate 3-nanometer class FinFET structures made with APS™ on Intel Silicon at trade show. @alixlabs.bsky.social #ALEtch #Semiconductor
www.alixlabs.com/2025/02/07/a...
February 7, 2025 at 7:18 AM
AlixLabs to Showcase Latest APS™ Findings at SPIE Advanced Lithography + Patterning
Swedish semiconductor startup to demonstrate 3-nanometer class FinFET structures made with APS™ on Intel Silicon at trade show. @alixlabs.bsky.social #ALEtch #Semiconductor
www.alixlabs.com/2025/02/07/a...
Swedish semiconductor startup to demonstrate 3-nanometer class FinFET structures made with APS™ on Intel Silicon at trade show. @alixlabs.bsky.social #ALEtch #Semiconductor
www.alixlabs.com/2025/02/07/a...
Researchers from Stanford University and Yonsei University have investigated the role of silicon seed layers in enabling #ALDep of #HfO₂ on monolayer #MoS₂, achieving sub-nanometer EOT & threshold voltage control. #2Dmaterials #semiconductor www.blog.baldengineering.com/2025/02/high...
High-Precision ALD and Etching Techniques Enable Sub-1nm EOT in Monolayer MoS₂ Transistors
Blog about Atomic Layer Deposition (ALD), Atomic Layer Etching (ALE) and Chemical Vapor Deposition (CVD)
www.blog.baldengineering.com
February 7, 2025 at 6:02 AM
Researchers from Stanford University and Yonsei University have investigated the role of silicon seed layers in enabling #ALDep of #HfO₂ on monolayer #MoS₂, achieving sub-nanometer EOT & threshold voltage control. #2Dmaterials #semiconductor www.blog.baldengineering.com/2025/02/high...