#PillarHall
With kind help from Chipmetrics, I updated the #Zotero public library with #PillarHall conformality study articles. Almost all (25) are atomic layer deposition #ALDep, plus some #CVDep. Seeds from #ALDCoE growing, public funding (by AKA/RCF). @aalto.fi

Access here:
www.zotero.org/groups/58969...
March 5, 2025 at 1:44 PM
(Well, VTT created it, upon my wishes. It contained a references page, where all the articles were collected, using the #PillarHall chips that started as research from #ALDCoE #ALDep project)
March 4, 2025 at 3:02 PM
#PillarHall #Zotero open library here:
www.zotero.org/groups/58969...

For testing purposes, at least - we'll see.
Zotero | Your personal research assistant
www.zotero.org
March 4, 2025 at 2:59 PM
New try with Zotero.

(Because I run into a new interesting #PillarHall #LHAR paper, by Van De Poll et al., doi.org/10.1021/acs....)

Let's see how this will work
March 4, 2025 at 2:49 PM
Chipmetrics launches the PillarHall LHAR5 test chip, featuring a 100-nm gap height for precise process monitoring. It enables vendor-agnostic benchmarking, faster tool qual, & sustainable manufacturing, ensuring tighter control for 3DNAND & 3DDRAM advancements. #ALDep chipmetrics.com/the-pillarha...
February 10, 2025 at 8:05 PM
Hmh - I notice that the page by VTT on the publication from the ALDCOE is missing many.

Should I try update these...? Many #ALDep #PillarHall things came from this project!

cris.vtt.fi/en/projects/...
Finnish Centre of Excellence in Atomic Layer Deposition
cris.vtt.fi
December 17, 2024 at 12:52 PM
Uh-oh

Is today the day that the #PillarHall website no longer exists?

I wanted to look at the summary of publications. But, the page does not open.

"Nothing is forever". "All good things come to an end."

(Maybe it comes up again. Once there was the same situation, and it came.)

pillarhall.com
December 9, 2024 at 11:27 AM
🧪 Most recent paper from our group at #AaltoCHEM: Gonsalves et al., "Simulated conformality of atomic layer deposition in lateral channels: the impact of the Knudsen number on the saturation profile characteristics", PCCP 2024

#ALDep #ALDepSky #PillarHall #AaltoUniversity

doi.org/10.1039/D4CP...
Simulated conformality of atomic layer deposition in lateral channels: the impact of the Knudsen number on the saturation profile characteristics
Atomic layer deposition (ALD) is exceptionally suitable for coating complex three-dimensional structures with conformal thin films. Studies of ALD conformality in high-aspect-ratio (HAR) features typi...
doi.org
November 19, 2024 at 4:55 PM