Running a microdot meth lab tonight to qualify our new photoresist that combines calixarene/ hyperbranched/boronate polymers, MOF-PAG/thiophene, and GO quenchers for a PFAS-free, low-defect, substrate- agnostic resist with ArF/KrF compatibility, which can also be used on advanced nodes

Tom's hardware just ripped off and translated an article straight out of @nrcnl.bsky.social right after I quoted a post of theirs on X and mentioned it. Russian attempts at lithography is the theme.
Their article: www.tomshardware.com/tech-industr...
Original article: www.nrc.nl/nieuws/2025/...

Deposition day

Polishing the product

Peek

The S in ASML stands for Silly

A lot of beaming these days. Into the new year.

30-micron tin droplet plasmafied using 3x60kHz laser. Upping the EUV ante from 2x50kHz for next gen machines, improving efficiency and productivity. #ASML