Pentti Niiranen
@penaniiranen.bsky.social
Reposted by Pentti Niiranen
In our latest preprint "Using a heavy inert diffusion additive for superconformal #ALDep" we show how to get step coverage > 1 in ALD. Great work by Arun, @paskalpamburayi.bsky.social, and @penaniiranen.bsky.social
chemrxiv.org/engage/chemr...
chemrxiv.org/engage/chemr...
Using a heavy inert diffusion additive for superconformal atomic layer deposition
The shrinking of device nodes increases the demand for deposition processes to seamlessly fill nanometer-scale features. Despite the precision of atomic layer deposition (ALD), it cannot deposit in a ...
chemrxiv.org
December 13, 2024 at 11:14 AM
In our latest preprint "Using a heavy inert diffusion additive for superconformal #ALDep" we show how to get step coverage > 1 in ALD. Great work by Arun, @paskalpamburayi.bsky.social, and @penaniiranen.bsky.social
chemrxiv.org/engage/chemr...
chemrxiv.org/engage/chemr...