PI: Prof. Dr. Ralph Spolenak
Webpage: https://met.mat.ethz.ch/
3:40 PM | Room 354 - Oliver Wipf: Controlled Kirkendall Voiding in Al-Au and Cu-Au Thin Films by Adjusting Sputtering Parameters.
3:40 PM | Room 354 - Oliver Wipf: Controlled Kirkendall Voiding in Al-Au and Cu-Au Thin Films by Adjusting Sputtering Parameters.
11:35 AM | Room 316 - Nikolaus Porenta: Mechanical Properties of Nanoporous Silver: Electrohydrodynamic-Redox Printing vs. PVD Sputtering
11:35 AM | Room 316 - Nikolaus Porenta: Mechanical Properties of Nanoporous Silver: Electrohydrodynamic-Redox Printing vs. PVD Sputtering